Publikationen aus dem Jahr 2001

U. Vogt, H. Stiel, I. Will, P. V. Nickles, W. Sandner, M. Wieland and T. Wilhein

Influence of laser intensity and pulse duration on the EUV-yield from a water jet target laser plasma

Appl. Phys. Lett. 79 (15), 2336-2338 (2001)

T. Wilhein, B. Kaulich, E. Di Fabrizio, J. Susini

Differential interference contrast x-ray microscopy

Soft X-Ray and EUV Imaging Systems II, SPIE 4506, 163-171 (2001)

M. Wieland, M. Faubel, M. Schmidt, U. Vogt and T. Wilhein

Soft X-ray and EUV emission from cryogenic liquid jets irradiated with fs, ps and ns-laser pulses

Application of X-Rays Generated from Lasers and Other Bright Sources II, SPIE 4504, 62-68 (2001)

T. Wilhein, B. Kaulich, J. Susini

Two zone plate interference contrast microscopy at 4 keV photon energy

Opt. Commun. 193, 19-26 (2001)

M. Wieland, T. Wilhein, M. Faubel, Ch. Ellert, M. Schmidt, O. Sublemontier

EUV and fast ion emission from cryogenic liquid jet target laser generated plasma

Appl. Phys. B 72 (5), 591-597 (2001)

M. Beck, U. Vogt, I. Will, A. Liero, H. Stiel, W. Sandner and T. Wilhein

A pulse-train laser driven XUV-source for picosecond pump-probe experiments in the water window

Opt. Commun. 190, 317-326 (2001)

T. Wilhein, B. Kaulich, E. Di Fabrizio, F. Romanato, S. Cabrini, J. Susini

Differential interference contrast x-ray microscopy with submicron resolution

Appl. Phys. Lett 78 (14), 2082 (2001)

U. Vogt, H. Stiel, I. Will, M. Wieland, T. Wilhein, P. V. Nickles, W. Sandner

Scaling-up a liquid water jet laser plasma source to high average power for Extreme Ultraviolet Lithography

E. A. Dobisz (ed.), Emerging Lithographic Technologies V, SPIE 4343 (2001)

U. Vogt, M. Wieland, T. Wilhein, M. Beck, H. Stiel

Design and application of a zone plate monochromator for laboratory soft x-ray sources

Rev. Sci. Instrum. 72 (1), (2001)